The effect(s) of mask alignment to P-N junction / Ahd Syarifuddin Mohd Helmi

Mohd Helmi, Ahd Syarifuddin (2010) The effect(s) of mask alignment to P-N junction / Ahd Syarifuddin Mohd Helmi. In: UNSPECIFIED. (Unpublished)

Abstract

[1]This study simplify the mask alignment process in fabrication of a simple p-n junction.
[2]Optimize the dimension of the device where the pattern is easy to be transfer on the wafer in fabricating a simple p-n junction.
[3]To design a suitable mask that is easy to transfer the pattern on the wafer to fabricate p-n junction.

Item Details

Item Type:	Conference or Workshop Item (Other)
Creators:	Creators Email / ID Num. Mohd Helmi, Ahd Syarifuddin 20078844
Contributors:	Contribution Name Email / ID Num. Thesis advisor Muhammad Khir, Farah Liyana UNSPECIFIED
Subjects:	Q Science > QC Physics > Heat T Technology > TK Electrical engineering. Electronics. Nuclear engineering > Electronics > Apparatus and materials > Semiconductors
Divisions:	Universiti Teknologi MARA, Shah Alam > Faculty of Applied Sciences
Page Range:	pp. 1-46
Keywords:	Mask Alignment, P-N junction, semiconductor
Date:	2010
URI:	https://ir.uitm.edu.my/id/eprint/67081

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