Mohd Helmi, Ahd Syarifuddin
(2010)
The effect(s) of mask alignment to P-N junction / Ahd Syarifuddin Mohd Helmi.
In: UNSPECIFIED.
(Unpublished)
Abstract
[1]This study simplify the mask alignment process in fabrication of a simple p-n junction.
[2]Optimize the dimension of the device where the pattern is easy to be transfer on the wafer in fabricating a simple p-n junction.
[3]To design a suitable mask that is easy to transfer the pattern on the wafer to fabricate p-n junction.
Metadata
| Item Type: | Conference or Workshop Item (Other) |
|---|---|
| Creators: | Creators Email / ID Num. Mohd Helmi, Ahd Syarifuddin 20078844 |
| Contributors: | Contribution Name Email / ID Num. Thesis advisor Muhammad Khir, Farah Liyana UNSPECIFIED |
| Subjects: | Q Science > QC Physics > Heat T Technology > TK Electrical engineering. Electronics. Nuclear engineering > Electronics > Apparatus and materials > Semiconductors |
| Divisions: | Universiti Teknologi MARA, Shah Alam > Faculty of Applied Sciences |
| Page Range: | pp. 1-46 |
| Keywords: | Mask Alignment, P-N junction, semiconductor |
| Date: | 2010 |
| URI: | https://ir.uitm.edu.my/id/eprint/67081 |
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