Abstract
The wet oxidation process is chosen to grow the oxide layer on the wafer surface. It is because the wet oxidation process has a significantly higher oxidation rate than the dry oxidation process. The n-type wafer was doped with the p-type material semiconductor, which is Boron. The Boron was doped on the wafer surface with the different scales of p-type regions and n-type regions. The size of p-type regions are 4mm, 5mm, 6mm, 7mm, and 8mm. For n-type regions, the size remains constant, which is 6mm. The furnace temperature was set up to 1100°C during the all doping processes. Four Point Probe was used to measure the sheet resistance of the wafer. Then, current-voltage characteristic are measured for all the pn-junctions by using I-V measurement. The devices of the 4mm p-type material semiconductor and 6mm n-type material semiconductor showed the best results of the current-voltage characteristic.
Metadata
Item Type: | Student Project |
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Creators: | Creators Email / ID Num. Maslihan, Ain Zubaidah UNSPECIFIED |
Contributors: | Contribution Name Email / ID Num. Thesis advisor Zakaria, Azlan UNSPECIFIED |
Subjects: | T Technology > TA Engineering. Civil engineering > Engineering instruments, meters, etc. Industrial instrumentation T Technology > TA Engineering. Civil engineering > Engineering machinery, tools, and implements |
Divisions: | Universiti Teknologi MARA, Shah Alam > Faculty of Applied Sciences |
Programme: | Bachelor of Science (Hons.) Industrial Physics |
Keywords: | PN-junction, Wet oxidation process, Wafer surface |
Date: | 2010 |
URI: | https://ir.uitm.edu.my/id/eprint/45052 |
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