The effects of P and N scaling on PN-junction characteristic / Ain Zubaidah Maslihan

Maslihan, Ain Zubaidah (2010) The effects of P and N scaling on PN-junction characteristic / Ain Zubaidah Maslihan. [Student Project] (Unpublished)

Abstract

The wet oxidation process is chosen to grow the oxide layer on the wafer surface. It is because the wet oxidation process has a significantly higher oxidation rate than the dry oxidation process. The n-type wafer was doped with the p-type material semiconductor, which is Boron. The Boron was doped on the wafer surface with the different scales of p-type regions and n-type regions. The size of p-type regions are 4mm, 5mm, 6mm, 7mm, and 8mm. For n-type regions, the size remains constant, which is 6mm. The furnace temperature was set up to 1100°C during the all doping processes. Four Point Probe was used to measure the sheet resistance of the wafer. Then, current-voltage characteristic are measured for all the pn-junctions by using I-V measurement. The devices of the 4mm p-type material semiconductor and 6mm n-type material semiconductor showed the best results of the current-voltage characteristic.

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Item Type: Student Project
Creators:
Creators
Email / ID Num.
Maslihan, Ain Zubaidah
UNSPECIFIED
Contributors:
Contribution
Name
Email / ID Num.
Thesis advisor
Zakaria, Azlan
UNSPECIFIED
Subjects: T Technology > TA Engineering. Civil engineering > Engineering instruments, meters, etc. Industrial instrumentation
T Technology > TA Engineering. Civil engineering > Engineering machinery, tools, and implements
Divisions: Universiti Teknologi MARA, Shah Alam > Faculty of Applied Sciences
Programme: Bachelor of Science (Hons.) Industrial Physics
Keywords: PN-junction, Wet oxidation process, Wafer surface
Date: 2010
URI: https://ir.uitm.edu.my/id/eprint/45052
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