Electrical properties of ZnO thin film prepared on seeded catalyst: article

This study focuses on the preparation ZnO thin film and effect on the surface morphology and electrical properties of ZnO thin film. The seeded ZnO catalyst was prepared by spin-coating technique using zinc acetate dehydrate (ZnAc) as starting material, 2-methoxyethanol as solvent, aluminium nitrate (Al(N03)3*9H20) as dopant and monoethanolamine (MEA) as stabilizer to coat onto silicon substrates. The ZnO thin films were deposited by thermal chemical vapor deposition (TCVD) method using zinc acetate dehydrate as a precursor and nitrogen as the carrier gas. The ZnO template asdeposited and post-annealed thin films are deposited and annealed at various temperatures from 400°C to 600°C. The effect of the surface morphology and electrical properties of ZnO thin film were investigated. Field gun emission scanning electron microscopy (FESEM) used to view the surface morphology of the samples. The surface morphology obtained from FESEM results showed the relationship between deposition temperatures for as-deposited and post-annealed thin films to the crystal structure and it also influenced the electrical properties of the ZnO thin films. The electrical properties are characterized using solar simulator measurement unit. This indicates that the electrical properties are improved in terms of conductivity for as-deposited thin film