Effect of temperature on electrical properties of undoped amorphous carbon thin films deposited by bias- assisted pyrolysis-CVD: article

The undoped amorphous carbon thin films were deposited on glass substrates by bias-assisted pyrolysis-CVD at various deposition temperatures in the range of 250⁰C-550⁰C. The electrical, optical and structural properties were characterized by using current voltage (I-V) measurement, UV-VIS/NIR spectrophotometer and Atomic Force Microscopy (AFM). The electrical conductivity of amorphous carbon thin films increased as the temperature increased. The highest and lowest photo responses were found at 350⁰C and 500⁰C, respectively. The highest absorption coefficient was found at the high temperature, 550⁰C. The AFM images showed that, density and uniformity have correlated with the resistivity and conductivity for undoped amorphous carbon thin films deposited at different temperatures.