Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata

Herman, Sukreen Hana and Kimihiro, Sasaki and Tomonobu, Hata (2004) Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata. In: STSS 2004: Sains Teknologi Jilid 1, 31 Mei – 1 Jun 2004, Hotel Vistana, Kuantan, Pahang.

Abstract

PZT films were prepared on Pt/Ti/SiO2/Si substrate by RF reactive sputtering apparatus using metal-oxide composite ZrTi+PbO2 powder and pellet targets. The main sputtering conditions are as follows: sputtering gas is argon and oxygen, gas pressure is 1810-2Torr, 02/Ar flow rate is 0% and
4.2%, substrate temperature is 200 (unintentionally heated), 450 and 550°C. PbOz target occupation is 300%. It is confirmed that PbOz pellet target has the potential to be the oxygen-source during the deposition with a high deposition rate. Perovskite PZT peak was observed in XRD measurement for film grown with PbO2 pellet target without introducing, my oxygen gas and with a small target occupation during deposition.

Metadata

Item Type: Conference or Workshop Item (Paper)
Creators:
Creators
Email / ID Num.
Herman, Sukreen Hana
UNSPECIFIED
Kimihiro, Sasaki
UNSPECIFIED
Tomonobu, Hata
UNSPECIFIED
Subjects: Q Science > QC Physics > Heat > Temperature
T Technology > TK Electrical engineering. Electronics. Nuclear engineering > Electric apparatus and materials. Electric circuits. Electric networks
T Technology > TP Chemical technology > Chemicals > Oxygen. Ozone
Divisions: Universiti Teknologi MARA, Pahang > Jengka Campus
Journal or Publication Title: Sains Teknologi Jilid 1
Event Title: STSS 2004: Sains Teknologi Jilid 1
Event Dates: 31 Mei – 1 Jun 2004
Page Range: pp. 436-440
Keywords: PZT, RF reactive sputtering, solid oxygen-source, deposition rate, pellet target
Date: 2004
URI: https://ir.uitm.edu.my/id/eprint/52734
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