Effect of annealing temperature on the surface morphology of titanium dioxide thin films prepared by sol-gel method / Nur Khairani Samin

Titanium dioxide (Ti02) thin films have been prepared using sol gel method and deposited by spin coating technique. Ti02 thin films were deposited on silicon and glass substrates. The influence of annealing temperature from 300°C to 500°C on the surface morphology, structural and optical properties were characterized by Scanning Electron Microscopy (SEM), X-Ray Diffraction (XRD) and Ultraviolet visible spectroscopy (UV-Vis). The SEM image of thin film deposited on silicon substrate shows the grain boundary of Tid is large and decrease with higher annealing temperature. While for thin films deposited on glass substrate do not shows any significant difference as the annealing temperature increased. This might happen due to lattice mismatching. Structural properties from the XRD analysis show that the Ti02 thin film is nanocrystalline anatase phase. While UV-Vis shows the thin films has high transmittance percentage of visible light and fully absorb the UV light at wavelength of 300 nm.