Fabrication of titanium dioxide (Ti02) on porous silicon (PSi) / Norhafizah Abd Razak

Titanium dioxide (TiC<2) is a material used in many applications either in form of powder, thin films and nanomaterial as well as nanorods. In this project, TiC<2 was fabricated on porous silicon (PSi) substrate. Coating of TiC>2 on PSi will be enhanced the absorption of light and very potential used in high performance cell fabrication. PSi was prepared by electrochemical method with lOmA/cm2 of current density and 20 min etching time. Sol gel method was used to prepare TiC>2 coating solution. The PSi substrate was then dipped in coating solution for fives times. The withdrawal speed was varied for 10, 20, 30, 40 and 50 mms"1. Raman spectra and AFM were used to measure the properties.