Properties of carbon nanotubes prepared by thermal Chemical Vapor Deposition (CVD) using fermented tapioca as a starting material / Siti Aishah Abdullah

Carbon nanotubes (CNTs) were deposited on silicon wafer (Si) by Thermal Chemical Vapor Deposition (TCVD). The new starting material of fermented tapioca was used as carbon source. The gas flow of Argon (Ar) was constant at 70 bubbles per minute and 20 minutes of deposition time. Before the deposition process, the silicon wafer was coated with Nickel catalyst using spin coater. Various parameters such as vaporization temperature and deposition temperature have been studied. Surface morphology and uniformity were characterized using FESEM while chemical functional groups of carbon nanotubes were characterized using FTIR. The FTIR result shows spectrum attributed to multi-walled carbon nanotubes (MWNTs) vibration modes. The surface morphology and uniformity of CNTs were dependent to parameters.