Electrical properties of nanostructured zinc oxide thin films deposited at various RF power by magnetron sputtering method for ammonia gas sensor application / Abdul Qawi Zainal

Nanostructured zinc oxide were deposited on thermally oxidized p-type silicone with various RF power by magnetron sputtering method. The electrical and physical properties of the thin films were investigates. The current-voltage were characterizes using two point probe method and the conductivity of the thin films increases while the resistivity decreases at higher sputtering power. It was found that the zinc oxide deposited at 300W gives the highest sensitivity. The surface morphology of the thin films were characterizes using field effect scanning electron microscope (FE-SEM). The results demonstrate the grain size increases with higher RF power. The thickness of the thin films were measured using DEKTAK 150 Surface Profiler and the result shows that the film thickness were higher as the RF power increase. It was found that the zinc oxide deposited at 300W gives the highest sensitivity.