Growth of ZnO nanostructures by thermal chemical deposition method on sputtered ZnO seed layer / Nur Hazwani Nordin

We investigated the growth of zinc oxide (ZnO) nanostructures on a crystallized ZnO seed layer. The seed layer was deposited by RF magnetron sputtering and etched by HF solution before the deposition of ZnO nanostructures by thermal chemical vapour deposition. The HF etching was done to roughen the seed layer surface to enhance the growth of the ZnO nanostructure. We found that the shapes of the nanostructures on the HF-etched seed layer and those on un-etched seed layer are different. The ZnO nanostructure on the HF-etched seed layer also gave better photoluminescence spectra compared to those on un-etched seed layer. These suggest that the surface condition of seed layer has some effect on the growth of the ZnO nanostructure.