Zinc oxide thin films properties dependence on the gas flow rate of thermal chemical vapor deposition / Mohamad Faid Muzahid Ali

Zinc oxide (ZnO) thin films were deposited using thermal chemical vapor deposition (TCVD) method with a two furnaces system. To enhance the growth of the nanostructure, the sol-gel spin coated ZnO templates were used. To study the effect of oxygen gas flow rate on the properties of the thin films, the gas flow rate were varied from 5 to 25 standard cubic centimeter per minute (sccm). The samples were characterized using field emission scanning electron microscopy (FESEM), photoluminescence (PL) spectra, current-voltage (I-V) measurement, X-Ray Diffraction (XRD). The FE-SEM images showed by increasing the gas flow rate of oxygen the feet of the nano-tetrapod became longer and thinner. Additionally, I-V curve shows that resistance of the thin films increase as the deposition oxygen gas flow rate increases.