Properties of amorphous carbon thin films for solar cell application / Norhafizan Mohd Hanib

This thesis is presented the research on properties of amorphous carbon (a-C) thin films for solar cell application. Amorphous carbon thin films have been deposited on silicon substrate by thermal chemical vapor deposition (Thermal-CVD) method at various deposition temperatures. The surface morphology and electrical properties of these films have been studied using Scanning Electron Mircoscope (SEM) and Current Voltage (I-V) Measurement (Advantest R6243 DC Voltage Current Source/Monitor Software), respectively. It was found that increasing deposition temperature had the most influence on the a-C thin films properties. In addition the carrier gas flow and catalyst concentration both showed a secondary impact on the properties of a-C thin films. The resistivity of a-C thin films decreases when the deposition temperature increases. However, at higher deposition temperature the conductivity increases due to the formation of more disorder sp carbon site.