Nanostructured zinc oxide thin film prepared by electrochemical deposition technique at different deposition time / Muhammad Fikri Khaidzir

ZnO thin films were deposited on the ITO-coated glass substrate from aqueous electrolyte containing 0.01M zinc chloride (ZnC₂) and 0.1M potassium chloride (KG) with the initial pH value of 6.0. The temperature of the aqueous solution was regulated at room temperature (27°C). The experiments were performed in a conventional electrochemical cell with three electrodes. The working electrode was ITO substrate, a platinum wire was used as a counter electrode, and a silver chloride electrode (Ag/AgCl) as a reference electrode. One set of samples were successfully prepared to study the influences of the deposition time on the growth of zinc oxide (ZnO) films. The samples were deposited at -1.5 V for 5, 10 and 15 min, respectively. The sample was characterized using Field Emission Scanning Electron Microscopy (FESEM), X-Ray Diffraction (XRD), and Ultraviolet-Visible Spectroscopy (UV-Vis) respectively. ZnO films presented uniform distribution and grain size become bigger when depositions time were increased. The XRD analysis shows that the formation of ZnO is nanostructured. For their transmittance graph, it was found that the transmittance increased when the deposition time is decrease.