The effects of UV light on the polymerization of photoresist / Husna Ahmad Tarmizi

Ahmad Tarmizi, Husna (2012) The effects of UV light on the polymerization of photoresist / Husna Ahmad Tarmizi. [Student Project] (Unpublished)

Download

[thumbnail of 46830.pdf] Text
46830.pdf

Download (109kB)

Abstract

In this study, the p-type and n-type silicon wafer is coated with positive photoresist. Both coating process is using spin on photoresist. The effects of UV light exposure and etching time is studied between thin and thick photoresist thickness on both type of silicon wafer. The photoresist thickness will be fixed using only 2.5ml volume liquid photoresist when the UV exposure time is varied at 5s, 10s, 15s, 20s, 25s, 30s, 35s, 40s, 45s and also 50s. The same applies when the photoresist thickness is fixed using only 5.0ml volume liquid photoresist, the same UV exposure time is varied. Other parameters that had been fixed are spin-coat speed and time; at 1000 rpm for 10 seconds in order to get uniform photoresist thickness throughout the wafer surface. After photoresist coating process and UV exposure via Wafer Photoresist Module (WPM) and Aligner and Exposure respectively, the etching time or known as development time will be taken using stop watch. Data of polymerization or known as etching rate versus UV exposure time is plotted into graphs and had been compared between thin and thick photoresist and also different types of silicon wafer.

Metadata

Item Type: Student Project
Creators:
Creators
Email
Ahmad Tarmizi, Husna
UNSPECIFIED
Contributors:
Contribution
Name
Email / ID Num.
Thesis advisor
Azis, Aniszawati
UNSPECIFIED
Subjects: Q Science > QC Physics > Optics. Light
Q Science > QC Physics > Nuclear and particle physics. Atomic energy. Radioactivity
Q Science > QC Physics > Geophysics. Cosmic physics
Divisions: Universiti Teknologi MARA, Shah Alam > Faculty of Applied Sciences
Programme: Bachelor of Science (Hons.) Industrial Physics
Item ID: 46830
Uncontrolled Keywords: UV light, Polymerization, Photoresist, Wafer Photoresist Module (WPM)
URI: https://ir.uitm.edu.my/id/eprint/46830

Fulltext

Fulltext is available at:
  • Koleksi Akses Terhad | PTAR Utama | Shah Alam
  • ID Number

    46830

    Indexing


    View in Google Scholar

    Edit Item
    Edit Item