The study and optimization of titanium dioxide (TiOz) nano structures by RF magnetron sputtering / Nur Amierah Mohd Asib

Radio Frequency (RF) magnetron sputtering is one of the method to produce Titanium dioxide (TiOa) nanostructures. Where, mixture of argon and oxygen gas are used as the main sputtering to strike the solid target material which is pure Ti02, to eject the atoms in the target material for deposition of Ti02 nanostructures. Meanwhile, to study the optimization of Ti02 nanostructures, it can be deposited by controlling the parameters of RF magnetron sputtering such as RF power and sputtering pressure. Then, the properties of Ti02 nanostructures can be determined by using Atomic Force Microscope (AFM), Field Emission Scanning Electrons Microscope (FESEM) and Ultraviolet-visible Spectroscopy (UV-Vis). For the samples of varies RF power, the optimum Ti02 nanostructures was deposited at 200 W (P20). Where, the sample of P20 has the lowest surface roughness (0.166 nm) and the smallest Ti02 size particles (36.3 nm) with the indirect optical band gap of 3.39 eV. While for the samples of varies RF pressure, the optimum Ti02 nanostructures was deposited under working pressure of 11 mTorr (PI 1) which also has the lowest surface roughness (0.202 nm), the smallest Ti02 size particles (24.1 nm) with the value of indirect optical band gap of 3.41 eV.